200µm substrate thickness with membrane thicknesses from 20nm to 500nm.
Special prices valid while stocks last.
All prices exclude VAT.
DescriptionTech Data
Product Description
Silicon nitride Si 3N 4 support membranes are suitable where carbon or plastic films are not appropriate. These silicon nitride membranes are extremely flat and smooth which significantly reduces the need for frequent re-focusing when scanning across large areas. The membranes have high stability under the electron beam and, being relatively chemically inert, are resistant to most chemicals with the exception of dilute HF, hot H2SO4 and free fluorine. The mechanical stability of the membrane allows a range of microscopy techniques, such as TEM, SEM and AFM, to be used for a variety of nanotechnology experiments. Cells, fibres and particles etc. can be mounted directly onto the support film and examined.
They are available with different window sizes on a silicon support frame designed to fit a standard 3mm TEM holder and in a range of membranes thicknesses from 20 to 500nm. The silicon nitride membranes are manufactured under clean room conditions and are chemically cleaned before packaging. Supplied as 10 support membranes in a grid box.
200µm substrate thickness
Technical Data
Custom window sizes are available on request.
Delivery & Returns
LEAD TIMES: Average Lead Times are shown individually in days for any products not currently in stock. Whilst we are working closely with our suppliers to minimise the impact of global supply chain issues, and regularly update our product prices and lead times, some are subject to change due to supply chain fluctuations.
Delivery is calculated at the checkout, please see our delivery and returns page for more information.
PRICE & AVAILABILITY: Please note that while we are working closely with our suppliers to minimise any global supply chain issues, prices and availability may be subject to change at short notice.
