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Support Films - Silicon
Holey Silicon Nitride Support Films

Holey Silicon Nitride Support Films

200nm membrane with holes from 1250nm down to 100nm.

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Description Tech Data

Name & Code

Grouped product items
Code & Description	Availability	Price	Qty
AG21580-10 Holey Silicon Nitride Support Film, 200nm, 1250nm pores, 0.5 x 0.5mm window, 3mm dia Pk10 Loading...	Loading...	POA	POA
AG21585-10 Holey Silicon Nitride Support Film, 200nm, 100nm pores, 0.5 x 0.5mm window, 3mm dia Pk10 Loading...	Loading...	POA	POA

Product Description

Advanced MEMS technologies have been applied to incorporate many improvements into this truly unique next generation Holey Silicon Nitride Support Membrane. Holey membranes or support films are also referred to as perforated or patterned films; there is no film or membrane covering the holes. The platform for this holey silicon nitride support film is the low stress 200nm amorphous silicon nitride support film on a circular 3mm silicon frame with a 0.5 x 0.5mm membrane. There are nine hole sizes available ranging from 1250nm to 100nm. This design has a number of advantages over previously offered products:

Relatively large open area
Closely packed, higher pore density using hexagonal pore pattern
Added resilience of membrane
Practical hole size for experiments
TEM standard circular shape
EasyGrip™ edge for improved handling

Holey Silicon Nitride Support Films are resistant to solvents, acids and bases, allowing for dynamic experiments directly on the holey membrane. The Silicon Nitride Support Films allow for high temperature experiments/imaging up to 1000°C. Films can be easily cleaned using glow discharge or plasma cleaning techniques. They also provide a carbon-free background for TEM imaging and analysis. The clean manufacturing techniques avoid the debris particles that are often found on other makes of silicon nitride support films.

Technical Data

Parameters for Holey Silicon Nitride Support Films are:

Membrane Thickness: 200nm for added resilience
Window Size: 0.5 x 0.5mm
Pore Diameter: Sizes are within 10% of diameter
Pattern: Close packed hexagonal arrangement of rows and columns - see table
Perforated Area: See table
Nominal Porosity: Range between 22.3% to 22.8%
Frame Thickness: Silicon support structure is 200µm standard. This allows for fitting in standard TEM holders and gives a sturdy support frame
Surface Roughness: The RMS (Rq) is 0.65 +/- 0.06nm which gives a mean roughness (Ra) of 0.45 +/- 0.02nm
Frame Diameter: TEM standard 3mm diameter disc, fully compatible with regular TEM holders and with EasyGrip™ edges for improved handling

Packaging:

The Holey Silicon Nitride Support Films are packaged under cleanroom conditions in a TEM Grid Storage Box. Each box holds 10 support films Hole Sizes and Pitch:
2.5µm circular pores with a 4.5µm pitch and 100 x 100 array
1.25µm circular pores with a 2.2µm pitch and 40 x 40 array
1.0µm circular pores with a 2.0µm pitch and 40 x 40 array
750nm circular pores with a 1.35µm pitch and 50 x 50 array
500nm circular pores with a 1.0µm pitch and 75 x 75 array
400nm circular pores with a 0.53µm pitch and 150 x 150 array
100nm circular pores with a 0.21µm pitch and 375 x 375 array
Multiple array pores with 6 pore sizes: 1000nm (12 x 12 array), 750nm (17 x 17 array), 500nm (25 x 25 array), 400nm (31 x 31 array), 350nm (42 x 42 array), and 300nm (50 x 50 array) (same pitches as individual pores). Pore positions in 200nm Si3N4 membrane

Delivery & Returns

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PRICE & AVAILABILITY: Please note that while we are working closely with our suppliers to minimise any global supply chain issues, prices and availability may be subject to change at short notice.