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Critical dimension (CD) calibration test specimens - 500-200-100 nm structure

Critical dimension (CD) calibration test specimens - 500-200-100 nm structure

This advanced CD calibration test specimen is suitable for calibrating smaller structures.

All prices exclude VAT.

Description

Name & Code

Grouped product items
Code & Description	Availability	Price	Qty
AGS1998 CD Calibration Specimen 500-200-100nm non certified Loading...	Loading...	POA	POA

Product Description

This advanced CD calibration test specimen is suitable for calibrating smaller structures. It comprises three line patterns, each identified by its pitch. Each pattern has five bars and spaces of equal pitch: 500, 200 and 100 nm. The central line area can be used for AFM measurements. The patterns are etched into silicon with a depth of approximately 45 to 50 nm. There is no coating on the silicon surface.

The specimen can be supplied unmounted or mounted on any of the standard range of SEM stubs. Please specify.

Delivery & Returns

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PRICE & AVAILABILITY: Please note that while we are working closely with our suppliers to minimise any global supply chain issues, prices and availability may be subject to change at short notice.