Geller Reference Standard MRS-4
A fifth Generation, high magnification reference standard for instrument calibration from 10X to 200,000X (1/2µm minimum pitch). NIST and NPL traceable for ISO9000 and ISO17025.
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Product DescriptionTechnical DataDelivery & Returns
The Geller MRS-4.2, is a fifth generation magnification calibration standard. These calibration standards are highly accepted pitch standards, they are offered as traceable certified reference materials or, optionally, at lower cost without traceability. To support the standard we offer a cleaning service and recertification program, as required by the ISO-9001, ISO-16700 and QS-9000 international quality standards.
- Electron Microscopy: SEM (secondary (in-lens & conventional and backscattered electrons), TEM (for use with a bulk holder- the MRS-4.2 can be reduced to 3mm dia by ½ mm thick).
- Scanning Microscopies and Profilometry: STM, AFM, stylus and optical etc. The pattern height is 70nm.
- Optical Microscopy: transmitted, reflected, bright/dark field, differential contrast, and confocal.
- Chemical mapping: EDS, WDS, micro/macro XRF, XPS, Auger & others. The pattern is fabricated using 70nm CrO2/Cr over quartz.
- Particle Size Counting: series of circles, squares & rectangles for calibration confirmation.
The simple geometric design of the MRS-4.2 has groups of nested squares spanning several orders of magnitude with pitches of ½µm, 1µm, 2µm, 50µm and 500µm. Newly incorporated into the standard is a ruler which is 6mm long with 1µm increments and large 1 and 2µm horizontal and vertical pitch patterns for ISO-16700 compliance. The pitch (the distance between repeating parallel lines using center-to-center or edge–to-edge spacing) is measured and certified. Linewidth measurements (the measurement of a single line or space width) can only be related if the same type of illumination is used as for the calibrating instrument since edge effects lead to uncertainty in the edge locations. Using pitch measurements errors from edge-to-edge locations cancel as long as like positions are measured.
