Critical Dimension Standards, 2mm-100nm, ISO Certified
Economically priced, fully-featured Critical Dimension Standards for calibration over 2.0mm to 100nm for a magnification range up to 10 - 200,000x. ISO Certified.
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Economically priced, fully-featured compliant Critical Dimension Standards for calibration over a wide measurement range.
Available with two size ranges, which are both offered as traceable and certified standards:
- 2.0mm to 1μm for a magnification range from 10x - 20,000x and is ideal for desktop SEMs and low to medium magnification applications.
- 2.0mm to 100nm for a magnification range up to 10 - 200,000x; for all SEM and most FESEM applications.
Each die has a unique serial identification number and is NIST traceable:
- Available with Global Certificate of Calibration using the average data measured for each production wafer
- Also available with an Individual Die Certificate of Calibration for higher accuracy
Manufactured on an ultra-flat silicon substrate with a precise 60nm chromium deposition for the features up to 5µm and a combination of 50nm gold over 20nm chromium for the features sizes from 2µm to 100nm.
The Cr and Au/Cr on Si provide excellent contrast both in SE and BSE imaging mode. The features are easier to determine than on etched Si standards. Since the silicon substrate, the chromium and the chromium/gold features are all conductive there are no charging issues with this calibration standard. Due to its sturdy construction, the CDMS standard can be cleaned using gentle plasma cleaning.
The smaller features are nested for easy navigation and quick calibration. The accuracy of the features is 0.3% or better. The actual size of the standard is 2.5 x 2.5mm with a thickness of 525µm ±20µm. There is no coating on the Si surface. Each CDMS calibration standard has a unique identification number.